\u6700\u8fd1\u79c1\u306f\u534a\u5c0e\u4f53\u7523\u696d\u5411\u3051\u306e\u6559\u80b2\u3060\u3051\u3067\u306a\u304f\u5b9f\u969b\u306e\u6280\u8853\u9762\u306e\u624b\u4f1d\u3044\u3082\u59cb\u3081\u3066\u3044\u307e\u3059\u3002\u5316\u5b66\u3068\u3044\u3046\u3053\u3068\u3067CMP(chemical mechanical polishing\/planarization, \u5316\u5b66\u6a5f\u68b0\u7814\u78e8\uff08\u307e\u305f\u306f\u5316\u5b66\u6a5f\u68b0\u5e73\u5766\u5316\uff09\uff09\u3068\u3044\u3046\u6280\u8853\u306b\u3064\u3044\u3066\u52c9\u5f37\u3057\u3066\u3044\u307e\u3059\u3002\u3053\u308c\u306f1983\u5e74\u306bIBM\u304c\u672c\u683c\u7684\u306b\u5c0e\u5165\u3057\u305f\u305d\u3046\u3067\u3059\u3002\u540c\u793e\uff08\u304a\u305d\u3089\u304fYorktown Heights, NY)\u306e\u4fe1\u983c\u6027\u90e8\u9580\u306b\u3044\u305fDr.Klaus D. Beyer\u304c\u767a\u660e\u8005\u3068\u3055\u308c\u3066\u3044\u307e\u3059\u3002
\nhttps:\/\/ecs.confex.com\/ecs\/245\/meetingapp.cgi\/Paper\/184168
\nhttps:\/\/nccavs-usergroups.avs.org\/wp-content\/uploads\/2024\/12\/CMPUG1224-Ses-1.1-BeyerK-RobertsB.pdf
\n\u305d\u306e\u3053\u308d\u96c6\u7a4d\u56de\u8def\u306e\u591a\u5c64\u5316\u304c\u672c\u683c\u5316\u3057\u3066\u7e26\u306e\u8cab\u901a\u914d\u7dda\u3092\u9020\u3063\u305f\u308a\uff08\u5f53\u521d\u306fCVD\u306b\u3088\u308b\u30bf\u30f3\u30b0\u30b9\u30c6\u30f3\uff09\u3001\u5fae\u7d30\u306a\u914d\u7dda\u306e\u96fb\u6c17\u62b5\u6297\u3092\u4e0b\u3052\u308b\u305f\u3081\u306b\u9285\u304c\u4f7f\u308f\u308c\u308b\u3088\u3046\u306b\u306a\u308a\u3001\u6c17\u76f8\u30fb\u771f\u7a7a\u3067\u306e\u30a8\u30c3\u30c1\u30f3\u30b0\u304c\u96e3\u3057\u3044\u306e\u3067\u5e73\u5766\u5316\u3059\u308b\u306b\u306f\u6a5f\u68b0\u7684\u306b\u524a\u308b\u3057\u304b\u306a\u3044\u3068\u3044\u3046\u3053\u3068\u306b\u306a\u3063\u305f\u3088\u3046\u3067\u3059\u3002\u5e73\u5766\u5316\u306e\u5fc5\u8981\u6027\u306f\u3001\u7e2e\u5c0f\u9732\u5149\u3067\u30de\u30b9\u30af\u304b\u3089\u30a6\u30a7\u30d5\u30a1\u306b\u3080\u3051\u3066\u5149\u304c\u53ce\u675f\u3059\u308b\u306e\u3067\u3001\u9ad8\u3055\u304c\u9055\u3046\u3068\u7126\u70b9\u304c\u5408\u308f\u306a\u304f\u306a\u308b\u305f\u3081\u3067\u3059\u3002\u73fe\u5728\u306e\u52a0\u5de5\u5bf8\u6cd5\u306f14nm\u7a0b\u5ea6\u306a\u306e\u3067\u3001nm\u30ec\u30d9\u30eb\u306e\u9ad8\u4f4e\u5dee\u304c\u30dc\u30b1\u3092\u751f\u3093\u3067\u3057\u307e\u3044\u307e\u3059\u3002\u805e\u304f\u3068\u3053\u308d\u306b\u3088\u308b\u3068\u3001\u6700\u5148\u7aef\u30d7\u30ed\u30bb\u30b9\u3067\u306f\u300130\u339d\u76f4\u5f84\u306e\u30a6\u30a7\u30d5\u30a1\u306b\u5bfe\u3057\u3066\u9ad8\u4f4e\u5dee\u306f3nm\u4ee5\u4e0b\u3001\u7d30\u304b\u3044\u51f8\u51f9\u306f0.2nm\u4ee5\u4e0b\u306b\u3059\u308b\u5fc5\u8981\u304c\u3042\u308b\u305d\u3046\u3067\u3059\u3002\u6050\u308d\u3057\u3044\u8981\u6c42\u6c34\u6e96\u3067\u3059\u3002
\nCMP\u306f\u5e747.8%\u306e\u6210\u9577\u5e02\u5834\u3060\u3068\u4e88\u60f3\u3055\u308c\u3066\u304a\u308a\u30012024\u5e74\u306f\u7d0460\u5104\u30c9\u30eb\u3001\u7d049000\u5104\u5186\u3067\u3059\u306d\u3002
\nhttps:\/\/www.gii.co.jp\/report\/moi1433907-chemical-mechanical-polishing-market-share.html
\n\u88c5\u7f6e\u30e1\u30fc\u30ab\u30fc\u3068\u3057\u3066\u306f\u7c73Applied Materials\u304c\u30c8\u30c3\u30d7\u3001\u65e5\u672c\u306e\u834f\u539f\u88fd\u4f5c\u6240\u304c2\u4f4d\u3001\u6771\u4eac\u7cbe\u5bc6\u304c\uff13\u4f4d\u306e\u3088\u3046\u3067\u3059\u3002\u7814\u78e8\u30d1\u30c3\u30c9\u3001\u7814\u78e8\u30b9\u30e9\u30ea\u30fc\uff08\u85ac\u6db2\uff09\u306f\u30ce\u30a6\u30cf\u30a6\u306e\u584a\u3067\u3059\u304c\u3001\u534a\u5c0e\u4f53\u88fd\u9020\u7528\u306e\u7d14\u5ea6\u304c\u8981\u6c42\u3055\u308c\u307e\u3059\u3002\u7825\u7c92\u306f\u6570\u5341nm\u306eSiO2\u3084CeO2\u3067\u3001pH\u5236\u5fa1\u3084\u932f\u5f62\u6210\u306e\u305f\u3081\u306e\u5316\u5b66\u7269\u8cea\u304c\u3044\u308d\u3044\u308d\u542b\u307e\u308c\u3066\u3044\u307e\u3059\u3002\u307e\u305f\u3001\u6b21\u306e\u30d7\u30ed\u30bb\u30b9\u306e\u305f\u3081\u306b\u7814\u78e8\u30b9\u30e9\u30ea\u30fc\u306e\u5b8c\u5168\u306a\u9664\u53bb\u304c\u5fc5\u8981\u3001\u3055\u3089\u306b\u30af\u30ea\u30fc\u30f3\u30eb\u30fc\u30e0\u5185\u306b\u5875\u3092\u51fa\u3057\u3066\u306f\u3044\u3051\u307e\u305b\u3093\u3002\u3044\u308d\u3044\u308d\u305f\u3044\u3078\u3093\u3067\u3059\u3002\u3069\u3046\u3084\u3063\u3066\u7814\u78e8\u304c\u8d77\u3053\u3063\u3066\u3044\u308b\u304b\u306f\u3042\u307e\u308a\u308f\u304b\u3063\u3066\u3044\u306a\u3044\u3068\u306e\u3053\u3068\u3067\u3001\u79c1\u306f\u30b7\u30df\u30e5\u30ec\u30fc\u30b7\u30e7\u30f3\u304b\u3089\u59cb\u3081\u3088\u3046\u3068\u601d\u3063\u3066\u3044\u307e\u3059\u3002\u4eca\u9031\u306fCMP\u306b\u304b\u304b\u308f\u308b\u6280\u8853\u3092\u89e3\u8aac\u3057\u307e\u3059\u3002<\/p>\n
\u82f1\u8a9e\u306f\u3000https:\/\/en.wikipedia.org\/wiki\/Chemical-mechanical_polishing
\n“It can be thought of as a hybrid of chemical etching and free abrasive polishing. It is used in the semiconductor industry to polish semiconductor wafers as part of the integrated circuit manufacturing process.”
\npolish \u78e8\u304f
\nabrasive \u7814\u78e8\u3001\u7814\u524a
\nintegrated circuit\u3000\u96c6\u7a4d\u56de\u8def
\nmanufacturing \u88fd\u9020
\n\u201dThe process uses an abrasive and corrosive chemical slurry (commonly a colloid) in conjunction with a polishing pad and retaining ring, typically of a greater diameter than the wafer\u201d
\ncorrosive \u30b3\u300c\u30ed\u300d\u30a6\u30b9\u30a3\u30f4\u3000\u8150\u98df\u6027\u306e
\nslurry \u30b9\u30e9\u30ea\u30fc\u3001\u6ce5\u6c34\u306e\u3088\u3046\u306a\u6db2
\nin conjunction with \uff5e\u3068\u4e00\u7dd2\u306b
\n“The dynamic polishing head is rotated with different axes of rotation (i.e., not concentric). ”
\n\u52d5\u304f\u7814\u78e8\u30d8\u30c3\u30c9\u306f\uff08\u7814\u78e8\u30d1\u30c3\u30c9\u3068\uff09\u7570\u306a\u308b\u56de\u8ee2\u8ef8\u3067\u56de\u8ee2\u3057\u3066\u3044\u308b\uff08\u3064\u307e\u308a\u3001\u540c\u5fc3\u56de\u8ee2\u3067\u306f\u306a\u3044\uff09\u3002
\n\u201dThis removes material and tends to even out any irregular topography, making the wafer flat or planar. This may be necessary to set up the wafer for the formation of additional circuit elements. For example, CMP can bring the entire surface within the depth of field of a photolithography system, or selectively remove material based on its position.\u201d
\nremove \u9664\u53bb\u3059\u308b
\neven out \u306a\u3089\u3059
\nirregular topography \u4e0d\u898f\u5247\u306a\u8868\u9762\u5f62\u72b6 \u3000\u3000topography = \u30c8\u30dd\u30b0\u30e9\u30d5\u30a3\u3001topos+ graphy\u3067\u5834\u6240\u3092\u66f8\u3044\u305f\u3082\u306e\u3001\u3067\u8868\u9762\u306e\u9ad8\u4f4e\u5dee\u306e\u56f3\u3092\u6307\u3057\u307e\u3059
\nentire suface \u5168\u8868\u9762
\ndepth of field of photolithography system \u30d5\u30a9\u30c8\u30ea\u30bd\u30b7\u30b9\u30c6\u30e0\u306e\u8996\u91ce\u6df1\u5ea6<\/p>\n","protected":false},"excerpt":{"rendered":"
\u6700\u8fd1\u79c1\u306f\u534a\u5c0e\u4f53\u7523\u696d\u5411\u3051\u306e\u6559\u80b2\u3060\u3051\u3067\u306a\u304f\u5b9f\u969b\u306e\u6280\u8853\u9762\u306e\u624b\u4f1d\u3044\u3082\u59cb\u3081\u3066\u3044\u307e\u3059\u3002\u5316\u5b66\u3068\u3044\u3046\u3053\u3068\u3067CMP(chemical mechanical polishing\/planarization, \u5316\u5b66\u6a5f\u68b0\u7814\u78e8\uff08\u307e\u305f\u306f\u5316\u5b66\u6a5f\u68b0\u5e73\u5766\u5316\uff09\uff09\u3068\u3044\u3046\u6280\u8853\u306b\u3064\u3044\u3066\u52c9\u5f37\u3057\u3066\u3044\u307e\u3059\u3002\u3053\u308c\u306f1983\u5e74\u306bIBM\u304c\u672c\u683c\u7684\u306b\u5c0e\u5165\u3057\u305f\u305d\u3046\u3067\u3059\u3002\u540c\u793e\uff08\u304a\u305d\u3089\u304fYorktown Heights, NY)\u306e\u4fe1\u983c\u6027\u90e8\u9580\u306b\u3044\u305fDr.Klaus D. Beyer\u304c\u767a\u660e\u8005\u3068\u3055\u308c\u3066\u3044\u307e\u3059\u3002 https:\/\/ecs.confex.com\/ecs\/245\/meetingapp.cgi\/Paper\/184168 https:\/\/nccavs-use…<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"om_disable_all_campaigns":false,"_monsterinsights_skip_tracking":false,"_monsterinsights_sitenote_active":false,"_monsterinsights_sitenote_note":"","_monsterinsights_sitenote_category":0,"footnotes":""},"categories":[47,42,44],"tags":[10,5,7],"class_list":["post-2198","post","type-post","status-publish","format-standard","hentry","category-worldresearchinstitutes","category-tech","category-materials","tag-worldresearchinstitutes","tag-tech","tag-materials"],"aioseo_notices":[],"_links":{"self":[{"href":"https:\/\/www.sekaiken.com\/index.php?rest_route=\/wp\/v2\/posts\/2198","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.sekaiken.com\/index.php?rest_route=\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.sekaiken.com\/index.php?rest_route=\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.sekaiken.com\/index.php?rest_route=\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/www.sekaiken.com\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=2198"}],"version-history":[{"count":0,"href":"https:\/\/www.sekaiken.com\/index.php?rest_route=\/wp\/v2\/posts\/2198\/revisions"}],"wp:attachment":[{"href":"https:\/\/www.sekaiken.com\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=2198"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.sekaiken.com\/index.php?rest_route=%2Fwp%2Fv2%2Fcategories&post=2198"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.sekaiken.com\/index.php?rest_route=%2Fwp%2Fv2%2Ftags&post=2198"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}